=== Apologies for multiple postings === (01)
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Call for Patterns and Problem Proposals (03)
2nd Workshop on Ontology Patterns (WOP2010) (04)
http://ontologydesignpatterns.org/wiki/WOP:2010 (05)
November 8th, 2010 (06)
Shanghai International Convention Center, Shanghai, China (07)
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Submission deadline - August 20 (11:59pm Hawaii time) (09)
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This workshop provides an arena for proposing and discussing good and
bad practices, patterns, pattern-based ontologies, systems, etc. The aim
is to broaden the pattern community that will develop its own “language”
for discussing and describing relevant problems and their solutions. The
workshop will be held in conjunction with ISWC2010 on November 8th. It
will be a full-day workshop consisting of three parts; papers,
posters/demos (including pattern posters), and “pattern writing” sessions. (011)
Specific focus is put on pattern posters and “pattern writing” sessions
as an opportunity for discussing and reaching consensus on best
practices in the field. The pattern writing sessions are closely related
to another interactive event series, namely VoCamps [1], since certain
types of patterns are in fact small vocabularies. The main difference is
that this workshop encompasses a broader range of patterns, and the
focus is on engineering best practices. (012)
Pattern submissions can be made in two categories: (013)
* Ontology Design Patterns (ODPs). ODP submissions are reviewed by
Pattern PC members, e.g. from the quality committee of the ODP
portal[2], and accepted patterns will be presented at the workshop as
posters in the joint poster session (together with paper posters as
demonstrations). (014)
* Problem proposals. Problem proposals are reviewed and voted by the
workshop PC and ODP portal committees, and the most interesting ones
will be the basis of the practical “pattern writing” at the workshop. (015)
---- Pattern Topics ----- (016)
Ontology design pattern (ODP) submissions will be collected through the
ODP portal [2], and templates for submission [3] are provided for the
following types of patterns (see general typology [4] for explanation of
the types): (017)
* Content patterns (018)
* Structural patterns: logical and architecture patterns. (019)
* Correspondence patterns: re-engineering and alignment patterns. (020)
For other types of patterns, or if the author wishes to elaborate on
theoretical rather than practical aspects, a pattern description may be
submitted as either a research paper or poster paper. A paper submission
can be accompanied by a pattern submission, however the submissions will
be reviewed separately. (021)
---- Problem proposals ---- (022)
Problem proposals should have the following features: (023)
* A non-trivial problem that currently has no pattern (generally
accepted solution) available (024)
* A problem relevant to the workshop community, i.e. an important and
interesting problem (025)
* The envisioned solution can be classified under one or more of the ODP
types described at [4] (026)
---- Process ----- (027)
Patterns are submitted through the ODP portal [2,3], and reviewed by at
least two members of the ODP portal quality committee. Accepted patterns
are to be improved based on the review comments, i.e., an update of the
patterns in the ODP portal is mandatory. Accepted patterns are then
presented as posters at the workshop, in a joint poster session with
paper posters and demos. After the workshop, the patterns may be
considered for certification in the ODP portal. (028)
Problem proposals are submitted through the “Post Modeling Issue”[5]
functionality of the ODP portal. Based on the description of problems
the workshop PC and the ODP portal committees will vote for the most
interesting and important problems, which will be selected for the
“pattern writing” session. At the workshop the person proposing the
problem has to be present to explain the problem. The workshop
participants will be divided into groups that will draft a solution for
the problem. At the end of the session each group presents its draft
solution, and if it is mature enough it will be posted in the ODP portal. (029)
---- Best Pattern Award ---- (030)
Reviewers and workshop participants will together distinguish the best
pattern submission, final decision to be made by the chairs. The best
pattern award takes into account criteria such as the quality of the
submission, the relevance and significance of the pattern, the
presentation of the pattern, and the level of involvement of the author
during the revision phase and poster session discussions during the
workshop. (031)
---- Important Dates ---- (032)
• Submission deadline - August 20 (033)
• Notification of acceptance - September 10 (034)
• Workshop date - November 8 (035)
Submission instructions at
http://ontologydesignpatterns.org/wiki/WOP:2010/Submission (036)
---- WOP2009 Chairs ---- (037)
Papers and posters – Valentina Presutti, StLab ISTC-CNR(IT) and Vinay K.
Chaudhri, SRI International (US) (038)
Patterns -Eva Blomqvist, StLab ISTC-CNR(IT) and Oscar Corcho,
Universidad Politécnica de Madrid (ES) (039)
Steering Committee (040)
Eva Blomqvist, STLab ISTC-CNR (IT) (041)
Aldo Gangemi, STLab ISTC-CNR (IT) (042)
Natasha Noy, Stanford University (US) (043)
Valentina Presutti, STLab ISTC-CNR (IT) (044)
Alan Rector, University of Manchester (UK) (045)
Francois Scharffe, INRIA (FR) (046)
Steffen Staab, University of Koblenz(DE) (047)
Chris Welty, IBM Research (US) (048)
[1] http://vocamp.org/wiki/WhatIsVoCamp (049)
[2] http://ontologydesignpatterns.org/ (050)
[3] http://ontologydesignpatterns.org/wiki/Submissions:SubmitAPattern (051)
[4] http://ontologydesignpatterns.org/wiki/OPTypes (052)
[5] http://ontologydesignpatterns.org/wiki/Community:PostModelingIssue (053)
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